Intel is set to receive its second “High NA” EUV (Extreme Ultraviolet) lithography tool from ASML, according to CEO Pat Gelsinger. The announcement was made during Intel’s earnings call on August 1. This new equipment, valued at 350 million euros ($383 million), is expected to enhance Intel’s chip-making capabilities.
The first High NA tool was delivered to Intel in December, and its installation is a lengthy process. Gelsinger revealed that the second tool is now en route to Intel’s Oregon facility. He noted that early signs from their technology investments are promising.
Despite this technological advancement, Intel’s financial performance has been under scrutiny, with concerns about the company’s turnaround efforts. ASML, the leading supplier of chip-making machinery, has not disclosed specific details about the customer but confirmed that it has begun shipping a second High NA tool to an unnamed buyer. Revenue from these sales is anticipated to be recorded within this year.
Intel plans to leverage these advanced tools to drive innovations in chip technology, with a goal to integrate them into commercial production by 2027.
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